Dielectric tunability of HfAlOx thin films for reconfigurable filter applications
HfO2-based ferroelectrics have received more and more attention recently due to their full compatibility with complementary metal oxide semiconductor technology and excellent scalability toward advanced technology nodes. However, most of the studies are focused on optimizing the ferroelectric proper...
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| Автори: | , , , , , , |
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| Формат: | Artigo |
| Мова: | Inglês |
| Опубліковано: |
World Scientific Publishing
2026-02-01
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| Серія: | Journal of Advanced Dielectrics |
| Предмети: | |
| Онлайн доступ: | https://www.worldscientific.com/doi/10.1142/S2010135X25500286 |
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