Facile Low-Temperature Deposition of Seedless Nanocrystalline Diamond Films from CH₄/Ar Gas Mixtures

Nanocrystalline diamond (NCD) films were synthesized by microwave plasma chemical vapor deposition (MPCVD) from a CH₄/Ar mixture on seedless p-type Si(111) substrates at 100–400 °C. Crystallinity was evaluated by X-ray diffraction (Cu Kα); bonding by Raman spectroscopy and X-ray photoelec...

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Detalhes bibliográficos

Principais autores:	Luis Medina-Zazueta, Frank Romo-García, Miguel Martínez-Gil, Rolando Flores-Ochoa, Mathías Martinez-Gil, Dainet Berman-Mendoza, Antonio Ramos-Carrazco, Gerardo Valenzuela-Hernández, Ch. J. Salas-Juárez, Carlos A. Pérez-Rábago, Rafael García-Gutiérrez
Formato:	Artigo
Idioma:	Inglês
Publicado em:	MDPI AG 2025-12-01
coleção:	Crystals
Assuntos:	nanocrystalline diamond (NCD) microwave plasma chemical vapor deposition (MPCVD) seedless growth low-temperature deposition hydrogen-free growth
Acesso em linha:	https://www.mdpi.com/2073-4352/16/1/10
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