Placement of Sub-Resolution Assist Features Based on a Genetic Algorithm
Resolution enhancement techniques compatible with an ArF (193 nm) immersion optical lithography system may constitute an effective means of minimizing the size of technology nodes of the dynamic random access memory. This paper investigated one such technique, namely mask optimization (MO), and appl...
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| Principais autores: | , , , , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
IEEE
2019-01-01
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| coleção: | IEEE Access |
| Assuntos: | |
| Acesso em linha: | https://ieeexplore.ieee.org/document/8752222/ |
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