Development of a Lithography Simulation Tool Set in Various Optical Conditions for Source Mask Optimization

Resolution Enhancement Techniques (RETs) in optical lithography have become essential for achieving the continuous shrinkage of technology nodes. The primary techniques in RETs include source mask optimization. Generally, lithography simulation, which estimates the image formed on wafers, is utilize...

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Autors principals:	Masaki Kuramochi, Yukihide Kohira, Hiroyoshi Tanabe, Tetsuaki Matsunawa, Chikaaki Kodama
Format:	Artigo
Idioma:	Inglês
Publicat:	IEEE 2024-01-01
Col·lecció:	IEEE Access
Matèries:	Optical lithography lithography simulation source mask optimization (SMO) transmission cross coefficient (TCC) sum of coherent system (SOCS)
Accés en línia:	https://ieeexplore.ieee.org/document/10504808/
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