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Multi-Objective Defocus Robust Source and Mask Optimization Using Sensitive Penalty

The continuous decrease in the size of lithographic technology nodes has led to the development of source and mask optimization (SMO) and also to the control of defocus becoming stringent in the actual lithography process. Due to multi-factor impact, defocusing is always changeable and uncertain in...

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Principais autores: Pengzhi Wei, Yanqiu Li, Tie Li, Naiyuan Sheng, Enze Li, Yiyu Sun
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI AG 2019-05-01
coleção:Applied Sciences
Assuntos:
computational lithography
source and mask optimization (SMO)
defocus robustness
process window enhancement
multi-objective optimization
Acesso em linha:https://www.mdpi.com/2076-3417/9/10/2151
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