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Study of the Electronic Properties and Hall Effect of Amorphous Si1-xGex:H Thin Films

The electronic properties and Hall effect of thin amorphous Si1-xGex:H films of thickness (350 nm) have been studied such as dc conductivity, activation energy, Hall coefficient under magnetic field (0.257 Tesla) for measuring carrier density of electrons and holes and Hall mobility as a function o...

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Bibliografiske detaljer
Hovedforfatter: M. F.A. Alias
Format: Artigo
Sprog:Inglês
Udgivet: University of Baghdad 2009-12-01
Serier:Iraqi Journal of Physics
Fag:
Online adgang:https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/876
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