Stitching Interferometry for X-Ray Mirror Metrology at the Hefei Advanced Light Facility (HALF)
The advancements in the 4th-generation synchrotron radiation light sources, characterized by their enhanced coherence and brightness, have led to more stringent requirements for the surface quality of X-ray mirrors used in beamlines. This poses a significant challenge to the metrology of X-ray mirro...
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| Hlavní autoři: | , , , , , , |
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| Médium: | Artigo |
| Jazyk: | Inglês |
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MDPI AG
2025-11-01
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| Edice: | Photonics |
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| On-line přístup: | https://www.mdpi.com/2304-6732/12/11/1106 |
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