Substrate-Driven Atomic Layer Deposition of High-κ Dielectrics on 2D Materials
Atomic layer deposition (ALD) of high-κ dielectrics on two-dimensional (2D) materials (including graphene and transition metal dichalcogenides) still represents a challenge due to the lack of out-of-plane bonds on the pristine surfaces of 2D materials, thus making the nucleation process highly disad...
Guardado en:
| Autores principales: | , , , |
|---|---|
| Formato: | Artigo |
| Lenguaje: | Inglês |
| Publicado: |
MDPI AG
2021-11-01
|
| Colección: | Applied Sciences |
| Materias: | |
| Acceso en línea: | https://www.mdpi.com/2076-3417/11/22/11052 |
| Etiquetas: |
Sin Etiquetas, Sea el primero en etiquetar este registro!
|