Substrate-Driven Atomic Layer Deposition of High-κ Dielectrics on 2D Materials
Atomic layer deposition (ALD) of high-κ dielectrics on two-dimensional (2D) materials (including graphene and transition metal dichalcogenides) still represents a challenge due to the lack of out-of-plane bonds on the pristine surfaces of 2D materials, thus making the nucleation process highly disad...
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| Principais autores: | , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
MDPI AG
2021-11-01
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| coleção: | Applied Sciences |
| Assuntos: | |
| Acesso em linha: | https://www.mdpi.com/2076-3417/11/22/11052 |
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