Ferroelectric Compensation Effect of the Hard Electrode for the HfO2‐ZrO2 Superlattice Films at the Low‐Annealing Temperature

Abstract This study investigates the ferroelectric (FE) performance of [HfO2/ZrO2]6 superlattice FE capacitors using different top electrodes (TE). The unidirectional rapid thermal annealing (RTA) process from 450 to 600 °C is conducted. The device's remanent polarization (Pr) improved with TE hardn...

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Principais autores:	Chuqian Zhu, Na Bai, Yufan Wang, Huajun Sun, Lanqing Zou, Yunhui Yi, Jiyang Xu, Jiawang Ren, Junming Zhang, Sheng Hu, Kanhao Xue, Lei Ye, Weiming Cheng, Qiang He, Xiangshui Miao
Formato:	Artigo
Idioma:	Inglês
Publicado:	Wiley-VCH 2025-08-01
Series:	Advanced Electronic Materials
Assuntos:	electrode strain ferroelectric hafnia superlattice zirconia
Acceso en liña:	https://doi.org/10.1002/aelm.202400830
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