Reliability Improvement from La2O3 Interfaces in Hf0.5Zr0.5O2‐Based Ferroelectric Capacitors

Abstract Further optimization of a typically reported ferroelectric capacitor comprised of a Hf0.5Zr0.5O2 ferroelectric thin film with TiN electrodes is explored by introducing an additional non‐ferroelectric La2O3 interfacial layer evaluated at different positions in the capacitor stack. The role o...

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Detalhes bibliográficos

Principais autores:	Furqan Mehmood, Ruben Alcala, Pramoda Vishnumurthy, Bohan Xu, Ridham Sachdeva, Thomas Mikolajick, Uwe Schroeder
Formato:	Artigo
Idioma:	Inglês
Publicado em:	Wiley-VCH 2023-03-01
coleção:	Advanced Materials Interfaces
Assuntos:	endurance ferroelectric Hf 0.5Zr 0.5O 2 interface La 2O 3 reliability
Acesso em linha:	https://doi.org/10.1002/admi.202202151
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