Effect of voltage on electrochemical mechanical polishing (ECMP) of 4H–SiC with fixed abrasives

This study employs the fixed agglomerated diamond abrasive pad (FADAP) to enhance the processing efficiency and surface quality of 4H–SiC. The effects of voltage on real-time current density, interface resistance, material removal rate (MRR), and surface roughness Ra during the electrochemical mecha...

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Номзүйн дэлгэрэнгүй

Үндсэн зохиолчид:	Pengfei Wu, Dongdong Zhao, Ning Liu, Chao Tang, Jun Li, Yongwei Zhu
Формат:	Artigo
Хэл сонгох:	Inglês
Хэвлэсэн:	Elsevier 2025-05-01
Цуврал:	Journal of Materials Research and Technology
Нөхцлүүд:	4H–SiC Fixed agglomerated diamond abrasive pad Electrochemical mechanical polishing Voltage Material removal rate
Онлайн хандалт:	http://www.sciencedirect.com/science/article/pii/S2238785425011809
Шошгууд:	Шошго нэмэх Шошго байхгүй, Энэхүү баримтыг шошголох эхний хүн болох!