Enhancing Grayscale E‐Beam Lithography: Thermal Treatment of Novolak‐Based Resist for 3D Nanostructures

Abstract Grayscale electron beam lithography enables the direct writing of 3D nanostructures, which are essential for advanced applications in photonics, biomimetics, and surface engineering, by spatially modulating exposure dose. However, realizing high‐resolution grayscale features remains challen...

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Egile Nagusiak:	Rahul Singh, Christian Vinther Bertelsen, Neeti Kalyani, Maria Dimaki, Winnie Edith Svendsen
Formatua:	Artigo
Hizkuntza:	Inglês
Argitaratua:	Wiley-VCH 2026-02-01
Saila:	Advanced Materials Interfaces
Gaiak:	grayscale lithography nanoscale fabrication novolak resists surface roughness thermal treatments
Sarrera elektronikoa:	https://doi.org/10.1002/admi.202500632
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