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Atomic layer deposited HfZrO4-based memristive devices: annealing effect and multilevel storage capability

In this work, an atomic layer deposited (ALD) Hf1Zr1O4 (HZO)-based switching layer is investigated in the device structure of a TiN/HZO/TiN. The thickness of the switching layer is ∼10 nm, which was grown by the thermal ALD at 250 °C by a super-cycle approach. Both pristine and annealed (400 °C for...

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Main Authors: Rahul Ramesh, Spyros Stathopoulos, Sanjay Kumar, Hannah Levene, Deepika Yadav, Andreas Tsiamis, Themis Prodromakis
Format: Artigo
Language:Inglês
Published: Frontiers Media S.A. 2026-01-01
Series:Frontiers in Nanotechnology
Subjects:
annealing effect
atomic layer deposition
ferroelectric memristor
HfZrO4
resistive switching
Online Access:https://www.frontiersin.org/articles/10.3389/fnano.2026.1729291/full
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