NEXAFS spectral peculiarities in Sn:SiO2 composite layer
Synchrotron-based near-edge X-ray absorption fine structure (NEXAFS) spectroscopy has been used to investigate a novel Sn:SiO2 composite thin layer grown by organometallic chemical vapor deposition technique (CVD) on a single crystalline silicon wafer with additional treatment by argon ions. Accordi...
Guardado en:
| Autores principales: | , , , , , |
|---|---|
| Formato: | Artigo |
| Lenguaje: | Inglês |
| Publicado: |
Elsevier
2025-08-01
|
| Colección: | Results in Physics |
| Materias: | |
| Acceso en línea: | http://www.sciencedirect.com/science/article/pii/S2211379725002335 |
| Etiquetas: |
Sin Etiquetas, Sea el primero en etiquetar este registro!
|