Plasmonic Characteristics of TiN Layers Deposited by ECWR Assisted MF Magnetron Sputtering
ABSTRACT This study investigates the plasmonic properties of TiN thin films deposited by pulsed mid‐frequency reactive magnetron sputtering combined with RF inductively coupled plasma in a DC magnetic field and electron cyclotron wave resonance (ECWR). The substrate was grounded while the plasma pot...
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| Principais autores: | , , , , , , , |
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| Format: | Artigo |
| Sprog: | Inglês |
| Udgivet: |
Wiley-VCH
2026-01-01
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| Serier: | Advanced Physics Research |
| Fag: | |
| Online adgang: | https://doi.org/10.1002/apxr.202500166 |
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