Plasmonic Characteristics of TiN Layers Deposited by ECWR Assisted MF Magnetron Sputtering

ABSTRACT This study investigates the plasmonic properties of TiN thin films deposited by pulsed mid‐frequency reactive magnetron sputtering combined with RF inductively coupled plasma in a DC magnetic field and electron cyclotron wave resonance (ECWR). The substrate was grounded while the plasma pot...

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Библиографические подробности

Главные авторы:	Libor Nožka, Miroslav Hrabovský, Zdenek Hubička, Aneta Písaříková, Jan Krajczewski, Petr Schovánek, Jan Tomáštík, Lukas Václavek
Формат:	Artigo
Язык:	Inglês
Опубликовано:	Wiley-VCH 2026-01-01
Серии:	Advanced Physics Research
Предметы:	ECWR magnetron sputtering plasmonics
Online-ссылка:	https://doi.org/10.1002/apxr.202500166
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