Biocompatible Porphyrin Derivatives Electron Beam and Extreme Ultraviolet Photoresists: High Resolution and High Etch Resistance

Abstract Electron beam lithography (EBL) and extreme ultraviolet lithography (EUVL) have been continuously improved and applied in semiconductor and biomedical device manufacturing. With the development of biomedical nanodevices, the demand for biodegradable, and environmentally friendly materials i...

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Xehetasun bibliografikoak

Egile Nagusiak:	Yurui Wu, Siliang Zhang, Xuewen Cui, Xue Cong, Shuang Liu, Lei Wang, Xudong Guo, Rui Hu, Shuangqing Wang, Jinping Chen, Yi Li, Jun Zhao, Shumin Yang, Yanqing Wu, Guoqiang Yang
Formatua:	Artigo
Hizkuntza:	Inglês
Argitaratua:	Wiley-VCH 2025-07-01
Saila:	Advanced Materials Interfaces
Gaiak:	biocompatible photoresist electron beam lithography etch resistance extreme ultraviolet lithography porphyrin derivatives
Sarrera elektronikoa:	https://doi.org/10.1002/admi.202500279
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