Biocompatible Porphyrin Derivatives Electron Beam and Extreme Ultraviolet Photoresists: High Resolution and High Etch Resistance
Abstract Electron beam lithography (EBL) and extreme ultraviolet lithography (EUVL) have been continuously improved and applied in semiconductor and biomedical device manufacturing. With the development of biomedical nanodevices, the demand for biodegradable, and environmentally friendly materials i...
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| Автори: | , , , , , , , , , , , , , , |
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| Формат: | Artigo |
| Мова: | Inglês |
| Опубліковано: |
Wiley-VCH
2025-07-01
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| Серія: | Advanced Materials Interfaces |
| Предмети: | |
| Онлайн доступ: | https://doi.org/10.1002/admi.202500279 |
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