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Pulsed I–V Analysis of Slow Domain Switching in Ferroelectric Hf0.5Zr0.5O2 Using Graphene FETs

Abstract In this study, the domain switching mechanism of ferroelectric HZO thin films is investigated by analyzing the bulk charge of a graphene field‐effect transistor with an HZO dielectric device by using a pulsed IV measurement method. The domain switching speed, which is generally difficult to...

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書誌詳細
主要な著者: Hyeon Jun Hwang, Seung Mo Kim, Byoung Hun Lee
フォーマット: Artigo
言語:Inglês
出版事項: Wiley-VCH 2024-01-01
シリーズ:Advanced Electronic Materials
主題:
オンライン・アクセス:https://doi.org/10.1002/aelm.202300511
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