Plasma-Enhanced Atomic Layer Deposition of AlF₃ Antireflective Coatings via Pulse-Time Control of Fluorine Radical Reactions

Plasma-enhanced atomic layer deposition (PEALD) is used to grow high-quality aluminum fluoride (AlF₃) antireflective coatings via a safe, HF-free route using trimethylaluminum and SF₆ plasma. In situ diagnostics reveal a reaction pathway mediated by a hydrogen-terminated fluori...

Celý popis

Podrobná bibliografie

Hlavní autoři:	Jing Zhang, Zhixuan Zhang, Chia-Hsun Hsu, Peng Gao, Yu Qiu, Yuqi Lin, Shui-Yang Lien
Médium:	Artigo
Jazyk:	Inglês
Vydáno:	MDPI AG 2025-12-01
Edice:	Nanomaterials
Témata:	aluminum fluoride plasma enhanced atomic layer deposition antireflective optical electronics
On-line přístup:	https://www.mdpi.com/2079-4991/16/1/43
Tagy:	Přidat tag Žádné tagy, Buďte první, kdo vytvoří štítek k tomuto záznamu!