Plasma-Enhanced Atomic Layer Deposition of AlF₃ Antireflective Coatings via Pulse-Time Control of Fluorine Radical Reactions

Plasma-enhanced atomic layer deposition (PEALD) is used to grow high-quality aluminum fluoride (AlF₃) antireflective coatings via a safe, HF-free route using trimethylaluminum and SF₆ plasma. In situ diagnostics reveal a reaction pathway mediated by a hydrogen-terminated fluori...

Ausführliche Beschreibung

Bibliografische Detailangaben

Hauptverfasser:	Jing Zhang, Zhixuan Zhang, Chia-Hsun Hsu, Peng Gao, Yu Qiu, Yuqi Lin, Shui-Yang Lien
Format:	Artigo
Sprache:	Inglês
Veröffentlicht:	MDPI AG 2025-12-01
Schriftenreihe:	Nanomaterials
Schlagworte:	aluminum fluoride plasma enhanced atomic layer deposition antireflective optical electronics
Online-Zugang:	https://www.mdpi.com/2079-4991/16/1/43
Tags:	Tag hinzufügen Keine Tags, Fügen Sie das erste Tag hinzu!