The Effect of Co/TiN Interfaces on Co Interconnect Resistivity
Electron transport measurements on Co/TiN multilayers are employed to explore the effect of TiN layers on Co resistivity. For this, 50 nm thick multilayer stacks containing <i>N</i> = 1–10 individual Co layers that are separated by 1 nm thick TiN layers are sputter deposited on SiO<sub>2</sub>/Si(00...
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| Główni autorzy: | , , , |
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| Format: | Artigo |
| Język: | Inglês |
| Wydane: |
MDPI AG
2025-12-01
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| Seria: | Surfaces |
| Hasła przedmiotowe: | |
| Dostęp online: | https://www.mdpi.com/2571-9637/8/4/89 |
| Etykiety: |
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