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Improved Endurance of Ferroelectric Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> Using Laminated-Structure Interlayer

In this article, the endurance characteristic of the TiN/HZO/TiN capacitor was improved by the laminated structure of a ferroelectric Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> thin film. Altering the HZO deposition ratio, the laminated-structure interlayer was formed in the middle of the HZO fil...

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Principais autores: Meiwen Chen, Shuxian Lv, Boping Wang, Pengfei Jiang, Yuanxiang Chen, Yaxin Ding, Yuan Wang, Yuting Chen, Yan Wang
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI AG 2023-05-01
Colecção:Nanomaterials
Assuntos:
ferroelectrics
ZrO<sub>2</sub>–HfO<sub>2</sub>
interlayer
laminated structure
endurance
reliability
Acesso em linha:https://www.mdpi.com/2079-4991/13/10/1608
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