High Oxygen Sensitivity of TiO₂ Thin Films Deposited by ALD

The gas sensitivity and structural properties of TiO₂ thin films deposited by plasma-enhanced atomic layer deposition (ALD) were examined in detail. The TiO₂ thin films are deposited using Tetrakis(dimethylamido)titanium(IV) and oxygen plasma at 300 °C on SiO₂ substr...

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Huvudupphov:	Aleksei V. Almaev, Nikita N. Yakovlev, Dmitry A. Almaev, Maksim G. Verkholetov, Grigory A. Rudakov, Kristina I. Litvinova
Materialtyp:	Artigo
Språk:	Inglês
Utgiven:	MDPI AG 2023-09-01
Serie:	Micromachines
Ämnen:	TiO<sub>2</sub> films atomic layer deposition gas-sensitive properties oxygen sensors sensory effect
Länkar:	https://www.mdpi.com/2072-666X/14/10/1875
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