Low specific contact resistance between InAs/Ni–InAs evaluated by multi-sidewall TLM
The specific contact resistance ρint of the InAs/Ni–InAs interface was evaluated by the multi-sidewall transmission line method (MSTLM), where Ni–InAs was formed by alloying Ni and InAs-on-insulator substrates. The revised test structure for MSTLM has been proposed, which can be easily fabricated. B...
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| Главные авторы: | , , , , |
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| Формат: | Artigo |
| Язык: | Inglês |
| Опубликовано: |
AIP Publishing LLC
2023-05-01
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| Серии: | AIP Advances |
| Online-ссылка: | http://dx.doi.org/10.1063/5.0150296 |
| Метки: |
Нет меток, Требуется 1-ая метка записи!
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