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Low specific contact resistance between InAs/Ni–InAs evaluated by multi-sidewall TLM

The specific contact resistance ρint of the InAs/Ni–InAs interface was evaluated by the multi-sidewall transmission line method (MSTLM), where Ni–InAs was formed by alloying Ni and InAs-on-insulator substrates. The revised test structure for MSTLM has been proposed, which can be easily fabricated. B...

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Главные авторы: Kei Sumita, Jun Takeyasu, Kasidit Toprasertpong, Mitsuru Takenaka, Shinichi Takagi
Формат: Artigo
Язык:Inglês
Опубликовано: AIP Publishing LLC 2023-05-01
Серии:AIP Advances
Online-ссылка:http://dx.doi.org/10.1063/5.0150296
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