Photometric control system for the etching rate of thin dielectric films
A methodology for photometric control of the etching rate of thin dielectric films is proposed, the essence of which consists in applying methods of double differentiation and time intervals to the signal of a photometric measuring device. An automated photometric system implementing this methodolog...
I tiakina i:
| Ngā kaituhi matua: | , |
|---|---|
| Hōputu: | Artigo |
| Reo: | Inglês |
| I whakaputaina: |
Politekhperiodika
2006-02-01
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| Rangatū: | Технологія та конструювання в електронній апаратурі |
| Ngā marau: | |
| Urunga tuihono: | https://tkea.com.ua/index.php/journal/article/view/991 |
| Ngā Tūtohu: |
Kāore He Tūtohu, Me noho koe te mea tuatahi ki te tūtohu i tēnei pūkete!
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