Negative index metamaterial at ultraviolet range for subwavelength photolithography

A negative index metamaterial (NIM) at ultraviolet range is constructed with stacked plasmonic waveguides. Based on the waveguides performing antisymmetric modes, the negative refractions of both wavevector and energy flow are realized when a TM-polarized light with a wavelength of 365 nm incidents...

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Bibliografski detalji

Glavni autori:	Jin Qijian, Liang Gaofeng, Kong Weijie, Liu Ling, Wen Zhongquan, Zhou Yi, Wang Changtao, Chen Gang, Luo Xiangang
Format:	Artigo
Jezik:	Inglês
Izdano:	Wiley 2022-03-01
Serija:	Nanophotonics
Teme:	negative index metamaterial plasmonic waveguide subwavelength photolithography
Online pristup:	https://doi.org/10.1515/nanoph-2022-0013
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