Negative index metamaterial at ultraviolet range for subwavelength photolithography
A negative index metamaterial (NIM) at ultraviolet range is constructed with stacked plasmonic waveguides. Based on the waveguides performing antisymmetric modes, the negative refractions of both wavevector and energy flow are realized when a TM-polarized light with a wavelength of 365 nm incidents...
Gorde:
| Egile Nagusiak: | , , , , , , , , |
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| Formatua: | Artigo |
| Hizkuntza: | Inglês |
| Argitaratua: |
Wiley
2022-03-01
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| Saila: | Nanophotonics |
| Gaiak: | |
| Sarrera elektronikoa: | https://doi.org/10.1515/nanoph-2022-0013 |
| Etiketak: |
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