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Multi-Technique Approach for Work Function Exploration of Sc<sub>2</sub>O<sub>3</sub> Thin Films

Thin films based on scandium oxide (Sc<sub>2</sub>O<sub>3</sub>) were deposited on silicon substrates to investigate the thickness effect on the reduction of work function. X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), energy dispersive X-ray reflectivity (EDXR), atomic force micr...

Ausführliche Beschreibung

Gespeichert in:
Hauptverfasser: Alessio Mezzi, Eleonora Bolli, Saulius Kaciulis, Alessandro Bellucci, Barbara Paci, Amanda Generosi, Matteo Mastellone, Valerio Serpente, Daniele Maria Trucchi
Format: Artigo
Sprache:Inglês
Veröffentlicht: MDPI AG 2023-04-01
Schriftenreihe:Nanomaterials
Schlagworte:
scandium oxide
work function
XPS
UPS
AFM
XRD
Online-Zugang:https://www.mdpi.com/2079-4991/13/8/1430
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