Photoluminescence in off-stoichiometric silicon oxide compounds
The photoluminescence properties of silicon rich oxide (SRO) and silicon oxynitride (SNO) films were studied. The materials were obtained by the low pressure chemical vapor deposition (LPCVD) technique, with some samples post-treated by Si-implantation and thermal annealing under different condition...
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| Publié dans: | Superficies y vacío |
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| Auteurs principaux: | , , , , , , , |
| Format: | Artigo |
| Langue: | Inglês |
| Publié: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
2004
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| Sujets: | |
| Accès en ligne: | https://www.redalyc.org/articulo.oa?id=94217101 |
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