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Homogeneity optimized layer deposition on large substrates in the molecular beam regime of Knudsen-type effusion sources
Radial beam flux inhomogeneities of Knudsen-type evaporation sources have an adverse effect on the lateralthickness distribution, dopant concentration and mole-fraction uniformity of deposited thin films on wafers, inparticular when the substrate size is of concern. Presently, the common and most su...
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| Publicado no: | Superficies y vacío |
|---|---|
| Main Authors: | , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
2000
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| Assuntos: | |
| Acesso em linha: | https://www.redalyc.org/articulo.oa?id=94201108 |
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