Growth of Pb(Zr0.53Ti0.47)O3 thin films on (111) silicon substrates
Pb(Zr0.53Ti0.47)O3 thin films were successfully grown on (111) silicon substrates by a high oxygen pressure RF sputtering technique which is used for the preparation of high Tc superconductors (HTS) thin films. Intermediate Ti and Al layers were evaporated on the (111) oxidized Si wafers and then su...
में बचाया:
| में प्रकाशित: | Superficies y vacío |
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| मुख्य लेखकों: | , , |
| स्वरूप: | Artigo |
| भाषा: | Inglês |
| प्रकाशित: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
1999
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| विषय: | |
| ऑनलाइन पहुंच: | https://www.redalyc.org/articulo.oa?id=94200942 |
| टैग: |
कोई टैग नहीं, इस रिकॉर्ड को टैग करने वाले पहले व्यक्ति बनें!
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