Growth of Pb(Zr0.53Ti0.47)O3 thin films on (111) silicon substrates

Pb(Zr0.53Ti0.47)O3 thin films were successfully grown on (111) silicon substrates by a high oxygen pressure RF sputtering technique which is used for the preparation of high Tc superconductors (HTS) thin films. Intermediate Ti and Al layers were evaporated on the (111) oxidized Si wafers and then su...

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Shranjeno v:
Bibliografske podrobnosti
izdano v:Superficies y vacío
Main Authors: O. Blanco, A. G. Castellanos Guzmán, J.L. Heiras
Format: Artigo
Jezik:Inglês
Izdano: Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. 1999
Teme:
Física, Astronomía y Matemáticas
PZT
XRD
SEM
thin films
sputtering
Online dostop:https://www.redalyc.org/articulo.oa?id=94200942
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