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Formation Process and Material Properties of Reactive Sputtered IrO2 Thin Films
IrO2 thin films were deposited by reactive sputtering in various O2 (O2+Ar) mixing ratios (OMR). The formation of IrO2 could be classified into two classes as depending on the O2 flow ratio. At low OMR (10 ~30%), the Ir target and Si substrate are not oxidized and high deposition rate and high cryst...
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| Veröffentlicht in: | Superficies y vacío |
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| Hauptverfasser: | , , , |
| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
1999
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| Schlagworte: | |
| Online Zugang: | https://www.redalyc.org/articulo.oa?id=94200936 |
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