Ion beam analysis of CH/Si layers deposited by ECR-CVD
We present in this study the characteristics of CH layers deposited on Si substrates using an electron cyclotron resonance (ECR) microwaveplasma source with different H2/CH4 mixtures. Quantification of the hydrogen and carbon content and the thickness of the films wasdetermined by Forward Elastic Sc...
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| Vydáno v: | Revista Mexicana de Física |
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| Hlavní autoři: | , , , , , , |
| Médium: | Artigo |
| Jazyk: | Inglês |
| Vydáno: |
Sociedad Mexicana de Física A.C.
2007
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| Témata: | |
| On-line přístup: | https://www.redalyc.org/articulo.oa?id=57066315 https://www.redalyc.org/journal/570/57066315/ https://www.redalyc.org/journal/570/57066315/html/ https://www.redalyc.org/journal/570/57066315/57066315.epub https://www.redalyc.org/journal/570/57066315/movil |
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