Influence of the carrier gas in the growth kinetics of TiO2 films deposited by aerosol assisted chemical vapor deposition with titanium-diisopropoxide as precursor
Titanium dioxide thin films were deposited on crystalline silicon (100) substrates by delivering a liquid aerosol of titanium-diisopropoxideand by using oxygen and nitrogen as carrier gases. The crystalline and morphological features indicate that the films are deposited by ametal organic chemical v...
Na minha lista:
| Publicado no: | Revista Mexicana de Física |
|---|---|
| Principais autores: | , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Sociedad Mexicana de Física A.C.
2006
|
| Assuntos: | |
| Acesso em linha: | https://www.redalyc.org/articulo.oa?id=57065312 |
| Tags: |
Sem tags, seja o primeiro a adicionar uma tag!
|