Carbon nitride films grown by cathodic vacuum arc for hemocompatibility applications

Amorphous carbon nitride films have been obtained by pulsed cathodic arc at substrate temperatures of 20, 100, 150 and 200 °C. Film structure was investigated by Fourier Transformed infrared spectroscopy (FTIR) and Raman spectroscopy. Nitrile bands at approximately 2200 cm-1 were identified in all f...

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Dades bibliogràfiques
Publicat a:Dyna
Autors principals: Diana Shirley Galeano-Osorio, Santiago Vargas, Rogelio Ospina-Ospina, Elisabeth Restrepo-Parra, Pedro José Arango
Format: Artigo
Idioma:Inglês
Publicat: Universidad Nacional de Colombia 2014
Matèries:
Ingeniería
FTIR spectroscopy
Raman spectroscopy
Carbon nitride films
substrate temperature
Accés en línia:https://www.redalyc.org/articulo.oa?id=49631663012
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