Commentary: A stitch too far

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Bibliographic Details
Published in:	JTCVS Tech
Main Author:	Sako, Edward Y.
Format:	Artigo
Language:	Inglês
Published:	Elsevier 2020
Subjects:	Commentary
Online Access:	https://ncbi.nlm.nih.gov/pmc/articles/PMC8308263/ https://ncbi.nlm.nih.gov/pubmed/34317984 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1016/j.xjtc.2020.10.018
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