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Fabrication of X-ray Gratings for Interferometric Imaging by Conformal Seedless Gold Electroplating
We present a method to produce small pitch gratings for X-ray interferometric imaging applications, allowing the phase sensitivity to be increased and/or the length of the laboratory setup to be minimized. The method is based on fabrication of high aspect ratio silicon microstructures using deep rea...
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| Publicat a: | Micromachines (Basel) |
|---|---|
| Autors principals: | , , , , , , , |
| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
MDPI
2021
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| Matèries: | |
| Accés en línia: | https://ncbi.nlm.nih.gov/pmc/articles/PMC8147938/ https://ncbi.nlm.nih.gov/pubmed/34066906 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi12050517 |
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