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Influence of Alumina Addition on the Optical Properties and the Thermal Stability of Titania Thin Films and Inverse Opals Produced by Atomic Layer Deposition

TiO(2) thin films deposited by atomic layer deposition (ALD) at low temperatures (<100 °C) are, in general, amorphous and exhibit a smaller refractive index in comparison to their crystalline counterparts. Nonetheless, low-temperature ALD is needed when the substrates or templates are based on po...

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Detalhes bibliográficos
Publicado no:Nanomaterials (Basel)
Main Authors: Waleczek, Martin, Dendooven, Jolien, Dyachenko, Pavel, Petrov, Alexander Y., Eich, Manfred, Blick, Robert H., Detavernier, Christophe, Nielsch, Kornelius, Furlan, Kaline P., Zierold, Robert
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI 2021
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC8074236/
https://ncbi.nlm.nih.gov/pubmed/33924052
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano11041053
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