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Effects of Post-Etch Microstructures on the Optical Transmittance of Silica Ridge Waveguides
Silica waveguides are often etched by reactive ion etch (RIE) processes. These processes can leave residual topography that can increase optical loss. We investigated the relation between optical loss and various RIE etch. A wet etch step meant to remove microstructures was also considered and compa...
Shranjeno v:
| izdano v: | J Lightwave Technol |
|---|---|
| Main Authors: | , , |
| Format: | Artigo |
| Jezik: | Inglês |
| Izdano: |
2020
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| Teme: | |
| Online dostop: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7996403/ https://ncbi.nlm.nih.gov/pubmed/33776196 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1109/jlt.2020.3012899 |
| Oznake: |
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