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Effects of Post-Etch Microstructures on the Optical Transmittance of Silica Ridge Waveguides

Silica waveguides are often etched by reactive ion etch (RIE) processes. These processes can leave residual topography that can increase optical loss. We investigated the relation between optical loss and various RIE etch. A wet etch step meant to remove microstructures was also considered and compa...

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Detalhes bibliográficos
Publicado no:J Lightwave Technol
Main Authors: Wright, Joel G., Schmidt, Holger, Hawkins, Aaron R.
Formato: Artigo
Idioma:Inglês
Publicado em: 2020
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC7996403/
https://ncbi.nlm.nih.gov/pubmed/33776196
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1109/jlt.2020.3012899
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