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Tuning Stoichiometry and Structure of Pd-WO(3−x) Thin Films for Hydrogen Gas Sensing by High-Power Impulse Magnetron Sputtering
By tuning the deposition parameters of reactive high-power impulse magnetron sputtering, specifically the pulse length, we were able to prepare WO(3−x) films with various stoichiometry and structure. Subsequently, the films were annealed in air at moderate temperature (350 °C). We demonstrate that t...
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| Publicado no: | Materials (Basel) |
|---|---|
| Main Authors: | , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
MDPI
2020
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7697909/ https://ncbi.nlm.nih.gov/pubmed/33198193 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma13225101 |
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