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Tuning Stoichiometry and Structure of Pd-WO(3−x) Thin Films for Hydrogen Gas Sensing by High-Power Impulse Magnetron Sputtering

By tuning the deposition parameters of reactive high-power impulse magnetron sputtering, specifically the pulse length, we were able to prepare WO(3−x) films with various stoichiometry and structure. Subsequently, the films were annealed in air at moderate temperature (350 °C). We demonstrate that t...

תיאור מלא

שמור ב:
מידע ביבליוגרפי
הוצא לאור ב:Materials (Basel)
Main Authors: Kumar, Nirmal, Haviar, Stanislav, Rezek, Jiří, Baroch, Pavel, Zeman, Petr
פורמט: Artigo
שפה:Inglês
יצא לאור: MDPI 2020
נושאים:
גישה מקוונת:https://ncbi.nlm.nih.gov/pmc/articles/PMC7697909/
https://ncbi.nlm.nih.gov/pubmed/33198193
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma13225101
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