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NIR Light‐Induced ATRP for Synthesis of Block Copolymers Comprising UV‐Absorbing Moieties

NIR exposure at 790 nm activated photopolymerization of monomers comprising UV‐absorbing moieties by using [Cu(II)/(TPMA)]Br(2) (TPMA=tris(2‐pyridylmethyl)amine) in the ppm range and an alkyl bromide as initiator. Some of them comprised structural elements selected either from those showing proton t...

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Bibliografiset tiedot
Julkaisussa:Chemistry
Päätekijät: Kütahya, Ceren, Meckbach, Nicolai, Strehmel, Veronika, Gutmann, Jochen S., Strehmel, Bernd
Aineistotyyppi: Artigo
Kieli:Inglês
Julkaistu: John Wiley and Sons Inc. 2020
Aiheet:
Linkit:https://ncbi.nlm.nih.gov/pmc/articles/PMC7496941/
https://ncbi.nlm.nih.gov/pubmed/32343443
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1002/chem.202001099
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