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NIR Light‐Induced ATRP for Synthesis of Block Copolymers Comprising UV‐Absorbing Moieties
NIR exposure at 790 nm activated photopolymerization of monomers comprising UV‐absorbing moieties by using [Cu(II)/(TPMA)]Br(2) (TPMA=tris(2‐pyridylmethyl)amine) in the ppm range and an alkyl bromide as initiator. Some of them comprised structural elements selected either from those showing proton t...
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| 出版年: | Chemistry |
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| 主要な著者: | , , , , |
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
John Wiley and Sons Inc.
2020
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| 主題: | |
| オンライン･アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7496941/ https://ncbi.nlm.nih.gov/pubmed/32343443 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1002/chem.202001099 |
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