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Rolling Nanoelectrode Lithography
Non-uniformity and low throughput issues severely limit the application of nanoelectrode lithography for large area nanopatterning. This paper proposes, for the first time, a new rolling nanoelectrode lithography approach to overcome these challenges. A test-bed was developed to realize uniform pres...
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| Publicado no: | Micromachines (Basel) |
|---|---|
| Main Authors: | , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
MDPI
2020
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7407333/ https://ncbi.nlm.nih.gov/pubmed/32630089 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi11070656 |
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