A carregar...

Rolling Nanoelectrode Lithography

Non-uniformity and low throughput issues severely limit the application of nanoelectrode lithography for large area nanopatterning. This paper proposes, for the first time, a new rolling nanoelectrode lithography approach to overcome these challenges. A test-bed was developed to realize uniform pres...

ver descrição completa

Na minha lista:
Detalhes bibliográficos
Publicado no:Micromachines (Basel)
Main Authors: Hasan, Rashed Md. Murad, Luo, Xichun, Sun, Jining
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI 2020
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC7407333/
https://ncbi.nlm.nih.gov/pubmed/32630089
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi11070656
Tags: Adicionar Tag
Sem tags, seja o primeiro a adicionar uma tag!