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In-situ characterization of ultrathin nickel silicides using 3D medium-energy ion scattering
Epitaxial ultrathin films are of utmost importance for state-of-the-art nanoelectronic devices, such as MOSFET transistors and non-volatile memories. At the same time, as the film thickness is reduced to a few nanometers, characterization of the materials is becoming challenging for commonly used me...
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| Publicado no: | Sci Rep |
|---|---|
| Main Authors: | , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Nature Publishing Group UK
2020
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7314745/ https://ncbi.nlm.nih.gov/pubmed/32581281 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-020-66464-1 |
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