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Investigation on Threshold Voltage Adjustment of Threshold Switching Devices with HfO(2)/Al(2)O(3) Superlattice on Transparent ITO/Glass Substrate

Threshold voltage adjustment in threshold switching (TS) devices with HfO(2)/Al(2)O(3) superlattice (by means of changing the cycle ratio of HfO(2) to Al(2)O(3) in atomic layer deposition) is investigated to implement a transparent cross-point array. TS devices with different cycle ratios (i.e., 3:1...

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Detalhes bibliográficos
Publicado no:Micromachines (Basel)
Main Authors: Choi, Yejoo, Shin, Jaemin, Moon, Seungjun, Shin, Changhwan
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI 2020
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC7281191/
https://ncbi.nlm.nih.gov/pubmed/32455725
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi11050525
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