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Pulsed Laser Deposition of Bismuth Vanadate Thin Films—The Effect of Oxygen Pressure on the Morphology, Composition, and Photoelectrochemical Performance
Thin layers of bismuth vanadate were deposited using the pulsed laser deposition technique on commercially available FTO (fluorine-doped tin oxide) substrates. Films were sputtered from a sintered, monoclinic BiVO(4) pellet, acting as the target, under various oxygen pressures (from 0.1 to 2 mbar),...
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| 出版年: | Materials (Basel) |
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| 主要な著者: | , , , , , , |
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
MDPI
2020
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| 主題: | |
| オンライン･アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7143622/ https://ncbi.nlm.nih.gov/pubmed/32192186 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma13061360 |
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